INESC-Microsystems and Nanotechnologies (INESC-MN)
Core Data
Hosting Legal Entity
Self-standing RI
Legal Status
Research organisation
Rua Alves Redol, 9, INESC, Lisboa, PO: 1000-029 (Portugal)
Type Of RI
Coordinating Country
Current Status:
Operational since 2002
Scientific Description
Mission and objectives
INESC MN is a private non profit research organization operating a class 10 and class 100 clean room facility with major research areas in spintronics, MEMS, thin film devices, and biosensors and biomedical devices.

RI Keywords
Spintronics, Biomedical Sciences, Biosensors, Nanotechnology, Microsystems, Microfluidics, MEMS
RI Category
Micro- and Nanotechnology facilities
Electrical and Optical Engineering Facilities
Biological/Biomedical Engineering and Biotechnology/Nanotechnology Research Facilities
Scientific Domain
Chemistry and Material Sciences
Physics, Astronomy, Astrophysics and Mathematics
ESFRI Domain
Physical Sciences and Engineering
Material deposition and etching
Integrated Processing and solutions for devices

INESC MN can provide integrated processing of films and devices by combining different technologies and equipment into a customized or semi-customized service.

Processing of soft lithographic techniques (SU8, PDMS) for microfluidics
Optoelectronics characterizations
GeSiM Nano-Plotter
Fluorescence microscope
Magnetoresistance measurement setups
Class 10 lithography area
Optical detection of electromechanical deflection (in air and vacuum)
Nordiko 3000

Ion beam deposition and milling - 6 inch wafer processing, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, Pt, MgO, AlOx, Al, Au, Ti)

Dicing saw
Automated lapping tool
Spin coating
Plasma enhanced chemical vapor deposition systems
Nordiko 3600

ion beam deposition and milling - 8 inch wafer, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, MgO, AlOx, Al, NiFeCr)

Hitachi Scanning Electron microscope
Aixtron NanoInstruments Black Magic

2-inch Plasma Enhanced Chemical Vapour Deposition system for graphene and nanotube growth, with methane, acetylene, hydrogen, ammonia, nitrogen and argon gas supply.

Olympus optical microscope
Dektak profilometer
Nordiko 7000

Magnetron sputtering - 6 inch wafer processing,


magnetron sputtering - 6 inch wafer processing, 1 target (mosaic CoZrNb)


Deposition of SiO2, Cr, Al, ITO, IZO, AZO, GeSbTe, Si, Ti, Ni

X-ray diffractometer
Class 100 cleanroom area
Rudolf ellipsometer
Ion-beam milling systems
Nordiko 2000

Magnetron and RF sputtering


RF sputtering - 6 inch wafer processing, 1 target (Al2O3)

Diffusion/passivation furnaces
Reactive ion etching system
Vibrating Sample magnetometer
Heidelberg DWLii direct write laser lithography
RAITH 150 electron beam lithograph
Additional Data
Access Type
Mail-in, Physical
Access Mode
Users Definition
User Demographics
National Users - 46.0% in 2017
European Users - 23.0% in 2017
Extra-European Users - 31.0% in 2017
Type of Users
Academic - 34.0%
Public research organisations - 34.0%
Industry/private companies - 31.0%