INESC-Microsystems and Nanotechnologies (INESC-MN)
Core Data
Hosting Legal Entity
Self-standing RI
Legal Status
Research organisation
Rua Alves Redol, 9, INESC, Lisboa, PO: 1000-029 (Portugal)
Type Of RI
Coordinating Country
Current Status:
Operational since 2002
Scientific Description
Mission and objectives
INESC MN is a private non profit research organization operating a class 10 and class 100 clean room facility with major research areas in spintronics, MEMS, thin film devices, and biosensors and biomedical devices.

RI Keywords
Biomedical Sciences, Nanotechnology, Spintronics, Biosensors, Microfluidics, Microsystems, MEMS
RI Category
Electrical and Optical Engineering Facilities
Biological/Biomedical Engineering and Biotechnology/Nanotechnology Research Facilities
Micro- and Nanotechnology facilities
Scientific Domain
Chemistry and Material Sciences
Physics, Astronomy, Astrophysics and Mathematics
ESFRI Domain
Physical Sciences and Engineering
Processing of soft lithographic techniques (SU8, PDMS) for microfluidics
Optoelectronics characterizations
Integrated Processing and solutions for devices

INESC MN can provide integrated processing of films and devices by combining different technologies and equipment into a customized or semi-customized service.

Material deposition and etching

RF sputtering - 6 inch wafer processing, 1 target (Al2O3)

GeSiM Nano-Plotter
X-ray diffractometer
Rudolf ellipsometer
Olympus optical microscope
Hitachi Scanning Electron microscope
Nordiko 3000

Ion beam deposition and milling - 6 inch wafer processing, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, Pt, MgO, AlOx, Al, Au, Ti)

Automated lapping tool
Nordiko 2000

Magnetron and RF sputtering

Nordiko 3600

ion beam deposition and milling - 8 inch wafer, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, MgO, AlOx, Al, NiFeCr)

Class 100 cleanroom area
Heidelberg DWLii direct write laser lithography
Dicing saw
Vibrating Sample magnetometer
Ion-beam milling systems
Class 10 lithography area
Optical detection of electromechanical deflection (in air and vacuum)
Diffusion/passivation furnaces
RAITH 150 electron beam lithograph
Spin coating
Magnetoresistance measurement setups

magnetron sputtering - 6 inch wafer processing, 1 target (mosaic CoZrNb)

Reactive ion etching system

Deposition of SiO2, Cr, Al, ITO, IZO, AZO, GeSbTe, Si, Ti, Ni

Aixtron NanoInstruments Black Magic

2-inch Plasma Enhanced Chemical Vapour Deposition system for graphene and nanotube growth, with methane, acetylene, hydrogen, ammonia, nitrogen and argon gas supply.

Fluorescence microscope
Nordiko 7000

Magnetron sputtering - 6 inch wafer processing,

Plasma enhanced chemical vapor deposition systems
Dektak profilometer
Additional Data
Access Type
Physical, Mail-in
Access Mode
Users Definition
User Demographics
Extra-European Users - 31.0% in 2017
European Users - 23.0% in 2017
National Users - 46.0% in 2017
Type of Users
Public research organisations - 34.0%
Academic - 34.0%
Industry/private companies - 31.0%