INESC-Microsystems and Nanotechnologies (INESC-MN)
http://www.inesc-mn.pt/
Core Data
Identification
Hosting Legal Entity
Self-standing RI
Legal Status
Research organisation
Location
Rua Alves Redol, 9, INESC, Lisboa, PO: 1000-029 (Portugal)
Structure
Type Of RI
Single-sited
Coordinating Country
Portugal
Status
Status
Current Status:
Operational since 2002
Scientific Description
Mission and objectives
INESC MN is a private non profit research organization operating a class 10 and class 100 clean room facility with major research areas in spintronics, MEMS, thin film devices, and biosensors and biomedical devices.

RI Keywords
MEMS, Biomedical Sciences, Biosensors, Nanotechnology, Microfluidics, Spintronics, Microsystems
Classifications
RI Category
Biological/Biomedical Engineering and Biotechnology/Nanotechnology Research Facilities
Electrical and Optical Engineering Facilities
Micro- and Nanotechnology facilities
Scientific Domain
Physics, Astronomy, Astrophysics and Mathematics
Chemistry and Material Sciences
ESFRI Domain
Physical Sciences and Engineering
Services
Material deposition and etching
Lithography
Optoelectronics characterizations
Integrated Processing and solutions for devices

INESC MN can provide integrated processing of films and devices by combining different technologies and equipment into a customized or semi-customized service.

Packaging
Processing of soft lithographic techniques (SU8, PDMS) for microfluidics
Equipment
Hitachi Scanning Electron microscope
X-ray diffractometer
Spin coating
UHVI

magnetron sputtering - 6 inch wafer processing, 1 target (mosaic CoZrNb)

GeSiM Nano-Plotter
Alcatel

Deposition of SiO2, Cr, Al, ITO, IZO, AZO, GeSbTe, Si, Ti, Ni

Fluorescence microscope
Dicing saw
Rudolf ellipsometer
Reactive ion etching system
Olympus optical microscope
Vibrating Sample magnetometer
Class 10 lithography area
Nordiko 7000

Magnetron sputtering - 6 inch wafer processing,

UHVII

RF sputtering - 6 inch wafer processing, 1 target (Al2O3)

Aixtron NanoInstruments Black Magic

2-inch Plasma Enhanced Chemical Vapour Deposition system for graphene and nanotube growth, with methane, acetylene, hydrogen, ammonia, nitrogen and argon gas supply.

RAITH 150 electron beam lithograph
Ion-beam milling systems
Dektak profilometer
Nordiko 3000

Ion beam deposition and milling - 6 inch wafer processing, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, Pt, MgO, AlOx, Al, Au, Ti)

Automated lapping tool
Diffusion/passivation furnaces
Nordiko 3600

ion beam deposition and milling - 8 inch wafer, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, MgO, AlOx, Al, NiFeCr)

Class 100 cleanroom area
Nordiko 2000

Magnetron and RF sputtering

Heidelberg DWLii direct write laser lithography
Optical detection of electromechanical deflection (in air and vacuum)
Plasma enhanced chemical vapor deposition systems
Magnetoresistance measurement setups
Additional Data
Access
Access Type
Physical, Mail-in
Access Mode
Wide
Users
Users Definition
Institutions
User Demographics
European Users - 23.0% in 2017
National Users - 46.0% in 2017
Extra-European Users - 31.0% in 2017
Type of Users
Public research organisations - 34.0%
Academic - 34.0%
Industry/private companies - 31.0%