Technical University of Madrid
Micro- and Nanotechnology facilities
Electrical and Optical Engineering Facilities
Chemistry and Material Sciences
Information Science and Technology
SEM, AFM and high resolution XRD.
Deposition of SiN and SiO layers.
Etching of different materials.
Optical lithography and e-beam lithography.
Characterization of optoelectronic devices (detector, emitters, etc.).
Deposition of magnetic thin films ((Fe, Ni, Co, FeNi, etc.).
Growth of Arsenides and Nitrides semiconductor compounds.
Evaporation by Joule effect of different metals: Au, AuGe, AuZn, Ni, etc.
Evaporation by electron beam of different metals: Au, Pt, Ti, Al, etc.
Standard optical enhanced lithography system with resolution >1 μm.
Photoluminescence systems with cryostat allowing measuring optical properties from 10K to room temperature.
Systems dedicated to electrical characterization of different types of optoelectronic devices.
Joule and e-beam evaporators for metal (Ti, Al, Mo, Ni, Au, etc) deposition.
Systems dedicated to the growth of magnetic heterostructures.
System dedicated to obtain electrical properties of thin films.
System for dicing different type of wafers.
Electrical characterization of devices with frequency up to 20 GHz.
Systems dedicated to determining crystal structures by performing different types of profiles.
System dedicated to obtain information on the surface morphology.
Systems for soldering micro wires.
System dedicated to characterize (electrically and optically) semiconductor materials and optoelectronic devices from room temperature up to 400°C and high frequency (up to 1 GHz) (C-V. I-V, C-f, 1/f noise, T, etc.).
Systems for depositing dielectric materials (SiN, SiO, etc).
Plasma-assisted reactive ion etching system.
4 MBEs systems dedicated to the growth of Arsenides and Nitrides semiconductor compounds.
System dedicated to obtaining morphology data and chemical analysis.
Electron beam nanolithography system with line resolution of 10 nm.
System dedicated to analyze surface morphology.
System dedicated to characterize magnetic thin films.
System dedicated to measure thicknesses.
Systems used for annealing of contacts and re-ordering of different materials.