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Micro Technology Research Laboratory (MTA TTK MFA - MEMS Laboratory)
Hosting Legal Entity
National Information Infrastructure Development Institute
Konkoly Thege Miklós út 29-33, Budapest, PO: 1121 (Hungary)
Type Of RI
Coordinating Country
Current Status:
Operational since 1971
Scientific Description
The clean room facility, the Laboratory of Microtechnology of MTA TTK MFA consists of a CMOS Si technology line, mask shop, a bulk micromachining design and fabrication line, a laboratory of microfluidics and a semiconductor photovoltaic development facility. The mission of the Laboratory of Microtechnology is the research and development of sensor principles, devices, actuators, functional micro and nanostructures by integrated the knowledge bases of microtechnology, biology, physics, chemistry, and other disciplines.

RI Keywords
Microtechnology, Microfluidics sensors, Microelectronics, Clean-room, Nanotechnology, Photovoltaic devices, Solar cell technology, Actuators sensor technology, Semiconductor technology
RI Category
Mechanical Engineering Facilities
Electrical and Optical Engineering Facilities
Micro- and Nanotechnology facilities
Scientific Domain
Information Science and Technology
Engineering and Energy
Physics, Astronomy, Astrophysics and Mathematics
Chemistry and Material Sciences
Materials science research infrastructure research laboratory testing methods and equipments experimental development measurements consulting education Others - integration of micro and nanosystems, device preparation

Open access to Microtechnology-MEMS-Microfluidics. Researchers , under- and postgraduated students are welcomed. National and international research and development projects are hosted. Applications have to be sent to e-mail address. The detailes of the access and the cost of the usage of equipments are listed at the web-pages of the laboratory.

- Characterization tools

Structural and functional characterizations of microdevices.

- Silicon CMOS Technology line

Complete microtechnology line including photolithography, high temperature treatments, thin film depositions (e-beam evaporation, sputtering, LPCVD, ALD), ion implantation, wet chemical treatments, dicing and packaging.

- Si 3D Micromatchining

High density plasma etching system for 3D etching of Si.

Date of last update: 08/03/2017
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