Vilnius University
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Vilnius University
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Engineering and Energy
Chemistry and Material Sciences
Study of materials structure using XRD, XPS, and optical microscopy.
Deposition of semiconductor epilayers and heterostructures by Molecular Beam Epitaxy (MBE), Metal-Organic Chemical Vapor Deposition (MOCVD), liquid epitaxy, and Chemical Vapor Deposition (CVD).
Access to equipment for photolithography, metal and dielectric layer deposition, thermal annealing, dry and chemical etching, bonding, and mounting; user support and training.
Organic semiconductor layer evaporation, casting, metallization, sealing, user support and training.
Equipment for photolithography, metal and dielectric layer deposition, thermal annealing, dry and chemical etching, bonding, and mounting.
Three Molecular Beam Epitaxy (MBE) machines. Metal-Organic Chemical Vapor Deposition (MOCVD) reactor. Liquid epitaxy equipment. Two Chemical Vapor Deposition (CVD) reactors.
Equipment for the organic semiconductor layer evaporation, casting, metallization, sealing, glove-boxes, etc.
X-ray characterization devices (XRD, XPS), microscopy devices.