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INESC-Microsystems and Nanotechnologies (INESC-MN)
Identification
Hosting Legal Entity
Self-standing RI
Legal Status
Research organisation
Location
Rua Alves Redol, 9, INESC, Lisboa, PO: 1000-029 (Portugal)
Structure
Type Of RI
Single-sited
Coordinating Country
Portugal
Status
Status
Current Status:
Operational since 2002
Scientific Description
INESC MN is a private non profit research organization operating a class 10 and class 100 clean room facility with major research areas in spintronics, MEMS, thin film devices, and biosensors and biomedical devices.

RI Keywords
Microfluidics, Biomedical Sciences, Biosensors, Nanotechnology, Spintronics, MEMS, Microsystems
Classifications
RI Category
Biological/Biomedical Engineering and Biotechnology/Nanotechnology Research Facilities
Micro- and Nanotechnology facilities
Electrical and Optical Engineering Facilities
Scientific Domain
Chemistry and Material Sciences
Physics, Astronomy, Astrophysics and Mathematics
ESFRI Domain
Physical Sciences and Engineering
Services
Optoelectronics characterizations
Integrated Processing and solutions for devices

INESC MN can provide integrated processing of films and devices by combining different technologies and equipment into a customized or semi-customized service.

Lithography
Packaging
Material deposition and etching
Processing of soft lithographic techniques (SU8, PDMS) for microfluidics
Equipment
UHVI

magnetron sputtering - 6 inch wafer processing, 1 target (mosaic CoZrNb)

Rudolf ellipsometer
X-ray diffractometer
Nordiko 7000

Magnetron sputtering - 6 inch wafer processing,

Plasma enhanced chemical vapor deposition systems
Optical detection of electromechanical deflection (in air and vacuum)
Olympus optical microscope
Ion-beam milling systems
Nordiko 3000

Ion beam deposition and milling - 6 inch wafer processing, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, Pt, MgO, AlOx, Al, Au, Ti)

Class 10 lithography area
Vibrating Sample magnetometer
Dektak profilometer
Class 100 cleanroom area
UHVII

RF sputtering - 6 inch wafer processing, 1 target (Al2O3)

GeSiM Nano-Plotter
RAITH 150 electron beam lithograph
Hitachi Scanning Electron microscope
Nordiko 3600

ion beam deposition and milling - 8 inch wafer, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, MgO, AlOx, Al, NiFeCr)

Heidelberg DWLii direct write laser lithography
Automated lapping tool
Diffusion/passivation furnaces
Dicing saw
Magnetoresistance measurement setups
Spin coating
Nordiko 2000

Magnetron and RF sputtering

Fluorescence microscope
Alcatel

Deposition of SiO2, Cr, Al, ITO, IZO, AZO, GeSbTe, Si, Ti, Ni

Reactive ion etching system
Aixtron NanoInstruments Black Magic

2-inch Plasma Enhanced Chemical Vapour Deposition system for graphene and nanotube growth, with methane, acetylene, hydrogen, ammonia, nitrogen and argon gas supply.

Access
Access Type
Mail-in, Physical
Access Mode
Wide
Users
Users Definition
Institutions
User Demographics
European Users - 23.0% in 2017
National Users - 46.0% in 2017
Extra-European Users - 31.0% in 2017
Type of Users
Public research organisations - 34.0%
Academic - 34.0%
Industry/private companies - 31.0%
Date of last update: 06/03/2018
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