You are here: Home / Infrastructures / Res. Infrastructure
INESC-Microsystems and Nanotechnologies (INESC-MN)
Identification
Hosting Legal Entity
Self-standing RI
Legal Status
Research organisation
Location
Rua Alves Redol, 9, INESC, Lisboa, PO: 1000-029 (Portugal)
Structure
Type Of RI
Single-sited
Coordinating Country
Portugal
Status
Status
Current Status:
Operational since 2002
Scientific Description
INESC MN is a private non profit research organization operating a class 10 and class 100 clean room facility with major research areas in spintronics, MEMS, thin film devices, and biosensors and biomedical devices.

RI Keywords
Microsystems, Microfluidics, Biomedical Sciences, Biosensors, MEMS, Spintronics, Nanotechnology
Classifications
RI Category
Biological/Biomedical Engineering and Biotechnology/Nanotechnology Research Facilities
Electrical and Optical Engineering Facilities
Micro- and Nanotechnology facilities
Scientific Domain
Chemistry and Material Sciences
Physics, Astronomy, Astrophysics and Mathematics
ESFRI Domain
Physical Sciences and Engineering
Services
Integrated Processing and solutions for devices

INESC MN can provide integrated processing of films and devices by combining different technologies and equipment into a customized or semi-customized service.

Processing of soft lithographic techniques (SU8, PDMS) for microfluidics
Optoelectronics characterizations
Lithography
Material deposition and etching
Packaging
Equipment
Hitachi Scanning Electron microscope
UHVI

magnetron sputtering - 6 inch wafer processing, 1 target (mosaic CoZrNb)

Plasma enhanced chemical vapor deposition systems
Ion-beam milling systems
Dektak profilometer
Class 100 cleanroom area
X-ray diffractometer
Olympus optical microscope
Heidelberg DWLii direct write laser lithography
Nordiko 2000

Magnetron and RF sputtering

Magnetoresistance measurement setups
Alcatel

Deposition of SiO2, Cr, Al, ITO, IZO, AZO, GeSbTe, Si, Ti, Ni

Rudolf ellipsometer
Vibrating Sample magnetometer
Class 10 lithography area
GeSiM Nano-Plotter
Reactive ion etching system
Spin coating
UHVII

RF sputtering - 6 inch wafer processing, 1 target (Al2O3)

RAITH 150 electron beam lithograph
Aixtron NanoInstruments Black Magic

2-inch Plasma Enhanced Chemical Vapour Deposition system for graphene and nanotube growth, with methane, acetylene, hydrogen, ammonia, nitrogen and argon gas supply.

Automated lapping tool
Nordiko 3000

Ion beam deposition and milling - 6 inch wafer processing, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, Pt, MgO, AlOx, Al, Au, Ti)

Nordiko 7000

Magnetron sputtering - 6 inch wafer processing,

Nordiko 3600

ion beam deposition and milling - 8 inch wafer, 6 targets (e.g. Ta, Ru, MnIr, MnPt, NiFe, CoFe, CoFeB, MgO, AlOx, Al, NiFeCr)

Optical detection of electromechanical deflection (in air and vacuum)
Fluorescence microscope
Dicing saw
Diffusion/passivation furnaces
Access
Access Type
Mail-in, Physical
Access Mode
Wide
Users
Users Definition
Institutions
User Demographics
National Users - 46.0% in 2017
Extra-European Users - 31.0% in 2017
European Users - 23.0% in 2017
Type of Users
Academic - 34.0%
Public research organisations - 34.0%
Industry/private companies - 31.0%
Date of last update: 06/03/2018
Printable version