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Micro-Electro-Mechanical Systems Research and Application Center (METU-MEMS)
Identification
Hosting Legal Entity
Middle East Technical University
Address:
Ankara Üniversitesi, Ankara, PO: 06110 (Turkey)
Location
Eskisehir Yolu 9. Km, Ankara, PO: 06531 (Turkey)
Structure
Type Of RI
Single-sited
Coordinating Country
Turkey
Status
Status
Current Status:
Operational since 2002
Scientific Description
MEMS activities at METU started in 1995 within the Electrical and Electronics Engineering Department. Since then a number of research projects have been conducted that are supported by various national and international institutions, including TUBITAK, the State Planning Organization (DPT), MSB Ar-Ge, SSM, the European Union's 6th and 7th Framework Programmes, NATO SfS Programme, NSF, TOFAS, and Intel.As a result, a considerable amount of knowledge and experience has been gained, and the first MEMS center was established in Turkey in 2008 as the METU-MEMS Center. At the METU-MEMS Center a wide variety of microsensors and components has been and is being developed, including low-cost CMOS infrared detectors, accelerometers, gyroscopes, DNA analysis systems, biosensors, micro power generators, chip cooling systems, acoustic sensors, humidity sensors, temperature sensors, frost sensors, piezoresistive and capacitive pressure sensors, and various RF MEMS components. Some of the developed prototypes show performance comparable to the best examples in the world, and efforts to commercialize these microsensors and microsystems are continuing.In the past 15 years, the METU-MEMS Center has collaborated with a number of national/international partners such as IMEC (one of the largest microelectronics/MEMS center in Europe), Intel, the University of Michigan at Ann Arbor, Arizona State University, the Massachusetts Institute of Technology, ASELSAN, TOFAS, and ARCELIK (also known as BEKO). With the help of these collaborations and the success of the projects, the METU-MEMS Center has gained well-deserved recognition both in national and international arenas. Based on this reputation, the IEEE/ASME MEMS 2006 conference was held in Istanbul, Turkey. The Center has recently been awarded a European Union 7th Framework Programme (EU-FP7) Regional Potentials (REGPOT) Project (METU-MEMS).The current goal of the METU-MEMS Center is to be a center of excellence in MEMS field, serving national and international research and technology for industrial development.

RI Keywords
Cell separation, IR Sensor, RF-MEMS, PowerMEMS, Microsystems, BioMEMS, MEMS, Rare cell detection, Gyroscope, Microbolometer, Microtechnology, IMU, Accelerometers, Energy harvesting
Classifications
RI Category
Micro- and Nanotechnology facilities
Scientific Domain
Information Science and Technology
Services
Testing and Characterization

Device-level testing; material characterization.

Fabrication

MEMS device fabrication; MEMS-based fabrication porcesses (thin film deposition, etching etc.).

Design

MEMS device design.

Equipment
SEM

JEOL Scanning Electron Microscope (SEM) up to 8", automatic loading, EDS option.

Laser Cutter

Newwave WAVN Quicklase 50ST laser cutter.

Spinner - 1

Bidtec Manual Spinner 4-6".

Mask/Bond Aligner (4 "-6 ")

EVG 620 Precision Alignment System & Bond Aligner for 4" and 6" wafers.

Plasma Activation

EVG 810 LT Plasma Activation.

Vapor HF etcher

PRIMAXX MEMS NGCET VAPOR HF ETCHER 4-6-8".

Electroplating

FIBRoplate process, uniformly on 4" & 6" wafers (Au, Ni, and Cu).

Wafer Dicer - 1

DISCO DAD 321 Silicon, glass, silicon-to-glass bonded and GaAs substrates, up to 6".

Evaporator - 2

Varian Thermal Evaporator (Cr, Ti, Au) 4-6".

Die Bonder

SET FC150 Automated Die / Flip Chip Bonder.

Grinder

Strasbaugh 7AF 4-6-8" Wafer grinder.

Surface Profiler - 1

Veeco Dektak 8 Profiler 4-6".

Wafer/Mask Cleaner

EVG 301 Wafer and Mask Cleaner.

O2 Plasma Tools

Nanoplus - 1,Nanoplus - 2,Branson IPC.

Critical Point Dryer - 2

TOUSIMIS 916B CRITICAL POINT DRYER, 4-6-8".

Mask Maker

HIMT DWL200 Laser Direct Writing 1µm resolution.

DRIE-1

STS Multiplex, Pegasus for 4" 6", and 8" wafers.

Sputter - 2

Bestec Automatic Loading (Cr, Ti, NiCr, Au) 4-6-8" Co-sputtering capability.

Four Point Probe - 2

QuadPro Four Point Probe Measurement System with heat controlled chuck.

Pick & Place Tools

Essemtec UP3100 manual placement system for BGA, CSP, and Fine Pitch components.

RIE - 2

SPTS Omega i2L APS RIE 6"-8" Wafers (SiO2, SixNy, polyimide).

Diffusion

Boron diffusion using BBr3 and B2H6 gases, Phosphorus diffusion using POCl3 gas, 26 furnaces, THERMCO.

Wafer Bonder - 2

EVG 520IS 4-6-8" Wafer Bonder (Silicon to glass anodic bonding, Eutectic bonding, Thermocompression bonding, Fusion Bonding).

RIE - 1

STS Multiplex RIE System for 4", 6" , and 8" wafers (Silicon Dioxide, Silicon nitride, BCB, Polyimide, Parylene).

Surface Profiler - 2

Veeco Wyko NT 1100 Optical Profiler.

Microscope - 1

Nikon 100x microscopes.

Thickness Measurement

Nanospec/AFT Computerized Film Thickness Measurement System.

Probe Station

Lucas Signatone 200 mm manual analytic probe station.

Die Bonder

TRESKY 3002 FC3 DIE BONDER.

Low pressure chemical vapour deposition systems (LPCVD)

TEMPRESS LPCVD SYSTEM, 4 tubes, 4-6", Silicon dioxide (SiO2), Silicon nitride (SixNy), Stress free silicon nitride (SixNy) and polysilicon.

Evaporator - 3

Varian Thermal Evaporator (Sn) 4-6".

Vacuum Packaging

POLARIS ACCUWELD-4270 VACUUM PACKAGING.

Stepper

ASML PAS 5500/200B Stepper (0.35µm resolution).

Wire Bonder - 2

Kluicke & Soffa Manual Wedge Bonder Model 4500.

Wafer Dicer - 2

DISCO DAD 3350 Silicon, glass, silicon-to-glass bonded and GaAs substrates, up to 8", with circle cut capability.

Mask/Bond Aligner 4 "-6 "-8 "

EVG 6200 Precision Alignment System & Bond Aligner for 4", 6", and 8" wafers.

Sputter - 1

Bestec Manual Loading (Cr, Ti, NiCr, Au) 4-6".

IR Microscope

Idonus IR Microscope.

Stress Measurement

TOHO TECHNOLOGY FLX-2320-S Wafer-Level Stress Measurement System.

PECVD - 2

SPTS Delta i2L APM PECVD System for 4", 6" , and 8" wafers (Silicon dioxide (SiO2), Silicon nitride (SixNy), Stress free silicon nitride (SixNy), Amorphous Si (A-Si)).

Ellipsometer

FTIR-210 IR-VASE Elipsometer.

Spinner - 3 / Spray Coater

Suss ACS200 Automatic coater/Spray coater 4-6-8" (2 spin, 2 develop, 1 spray, 1 bake, 1 HMDS stations).

DRIE-2

STS Multiplex ASE HRM System for 4" 6" wafers, and 8".

Chemical Mechanical Polishing (CMP)

İPEC 472 Wafer Polisher 4-6-8".

Microscope - 3

Hirox KH7700 3D digital microscope.

Wire Bonder - 4

Delvotec Al wedge bonder (Semi-Auto).

Sputter 3

AJA1/2/3 (Cr, Ti, Au, Cu, Ni, Al) 4-6", 3 separate chambers, Co-sputtering capability.

Probe Station

SUSS PAV 200 Automatic Probe Station with vacuum chamber, heat controlled chuck, Polytec MSA-500 dynamic MEMS analyser capability and chamber window for IR application.

Isotropic Si dry etch

Xactix X4 Non-plasma silicon etching based on Xenon Difluoride (XeF2) gas.

Parylene Deposition System

PDS 2000 Parylene Deposition System.

Four Point Probe - 1

Magnetron Model M-700 Four Point Probe System.

Wire Bonder - 1

Kluicke & Soffa Manual Universal Thermosonic Gold Ball Bonder Model 4124.

Evaporator -1

AJA e-beam evapoator (Ti, Cr, Pt, Au, Al) 4-6".

Critical Point Dryer - 1

TOUSIMIS 915B CRITICAL POINT DRYER, 4-6".

Etching

4-6-8" compatible wet benches (Silicon dioxide etching with BHF solution, Silicon nitride etching, Anisotropic silicon etching using KOH, TMAH, and EDP, Isotropic silicon etching using HNA, Electrochemical etching using KOH and TMAH solutions, Metal etching: Al, Cu, Ti, Ni, Cr, Au, Resist stripping in organic solvents).

Dry / Wet Oxidation

RCA cleaning prior to high-temperature treatment, Atmospheric thermal dry oxidation, Atmospheric thermal wet oxidation, High temperature drive-in under inert atmosphere, 5 furnaces, THERMCO.

Wire Bonder - 3

Delvotec Au ball bonder (Semi-Auto).

Wafer Bonder - 1

EVG 501 Universal Bonder 4" and 6" (Silicon to glass anodic bonding, Eutectic bonding, Thermocompression bonding, Fusion Bonding).

Microscope - 2

Nikon LV 150, 150x 8"-compatible optical microscope (2 pieces).

Spinner - 2

Suss LabSpin 8 Manual Spinner 4-6-8".

Plasma Enhanced Chemical Vapor Deposition (PECVD) - 1

STS Multiplex PECVD System for 4", 6" , and 8" wafers (Silicon dioxide (SiO2), Silicon nitride (SixNy), Stress free silicon nitride (SixNy), Amorphous Si (A-Si), Phosphosilicate glass (PSG), Borosilicate glass (BSG), Waveguide silicon dioxide (W-SiO2)).

Particle Scanner

Airborn particle scanner.

ICP (Metal RIE)

STS Multiplex ICP System for 4", 6" , and 8" wafers (Au, Ti, SiCr, Cr, Al).

Date of last update: 17/03/2014
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