The Institute of Ion Beam Physics and Materials Research at the Helmholtz-Zentrum Dresden-Rossendorf (HZDR) focuses its activities on materials research for future applications, e. g., in information technology and for energy conversion. To this end, a large variety of ion beam technologies is used for the synthesis, modification and analysis of solid surfaces, thin films and nanostructures. The range of materials being investigated extends from semiconductors, oxides and hard coatings to magnetic films or geological samples.Within this core competence, the Ion Beam Center (IBC) offers ion implantation, ion- and plasma-based thin film deposition and ion beam analysis to external users. Ion energies ranging from some 10 eV up to about 60 MeV are available from electrostatic accelerators, ion implanters and plasma equipment at more than 25 experimental stations. Moreover, for certain energy ranges, special techniques like an analytical ion-microprobe (focus < 5 µm), several focused-ion beam facilities (focus < 10 nm), highly-charged ion devices (charge state > 10+) or facilities for plasma-based ion implantation are available. As an international center for the application of ion beams in materials research and technology, the IBC shares its extensive know-how with partners from universities, various research institutions and from industry. The IBC is involved in national and international research collaborations. In cooperation with the HZDR Innovation GmbH, service activities in the field of ion beam processing of materials or electronic devices is offered at dedicated endstations.