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Laboratory for Nanostructures and Nanomaterials (LNSM)
Hosting Legal Entity
Czech Academy of Sciences
Na Slovance 1999/2, Institute of Physics AS CR, v.v.i., Prague 8, PO: 18221 (Czech Republic)
Type Of RI
Coordinating Country
Czech Republic
Current Status:
Operational since 2010
Being upgraded since 2018
Operational since 2010
Scientific Description
The LNSM has been founded by Institute of Physics, the largest research institute of the Academy of Sciences of the Czech Republic in 2008 by connecting laboratories with unique instruments and techniques. The unique equipment and experience resulted mainly from the Czech government programme Nanotechnology for Society running from 2006 to 2012. The LNSM was approved as a part of the Roadmap for Large Research, Development and Innovation Infrastructures in the Czech Republic by Government Decree No. 207 of 15 March 2010. Since the beginning of 2012 the open access use of the LSNM infrastructure was funded by the Ministry of Education, Youth and Sports of the Czech Republic within a project LM2011026.Since the very beginning LNSM belongs among the fully operational infrastructures, building on the previous experience and expertise of the staff.The main aim is effective exploitation of the unique infrastructure LNSM developed on basis of national and international grant projects and to insure operation of stable, sustainable and fully competitive laboratory at the top international level. It is fundamental to maintain the infrastructure in service independent of individual grant projects which may support the service but it is impossible to relay on them for the continual service and for „open-access“ regime. A long-lasting continuation of the laboratory service will enable us to solve top scientific problems in frame of our Institute and, simultaneously, enables other subjects to use this infrastructure for solution of key scientific problems. This, in turn, promotes future development of nanosciences and nanotechnologies in the Czech Republic as well as our significant participation in frame of ERA. The aims are: (1) to access the possibility of preparation of samples of wide spectrum of semiconducting and metallic nanostructures and nanomaterials; (2) to satisfy broad interest in experiments from national and foreign laboratories and to establish this cooperation in approximately ~30% of the capacity; (3) to perform reliable measurements via highly qualified operators; (4) to provide the „added value“ in form of the data processing and interpretation of the results; (5) to educate scientists and students to be able to control sophisticated facilities;(6) to provide remote access to electron microscopes through internet and in this way, to offer the measurements for external teams to participate in the experiment; (7) to integrate actively into the international scientific network by targeted contacting of potential customers and gradually increase the participation in frame of ERA; and (8) to participate in laboratory training for students.

RI Keywords
Nanomaterials, E-beam lithography, Electron microscopy, Thin film deposition, Nanotechnology, Nanostructures, Analytical TEM, Molecular beam epitaxy UHV atomic thin films, Atomic Force Microscopy
RI Category
Micro- and Nanotechnology facilities
Scientific Domain
Physics, Astronomy, Astrophysics and Mathematics
ESFRI Domain
Physical Sciences and Engineering
System of molecular beam epitaxy and metal-organic epitaxy (MBE/MOVPE)

Molecular beam epitaxy system is designed in particular for growing thin films of monocrystalline semiconductors of III-V type. Besides classical GaAs and AlGaAs based (hetero)structures it is capable of growing high-quality films of ferromagnetic semiconductor (Ga,Mn)As and other materials for spintronic research. The laboratory comprises also system for thin-film growth by metal-organic vapour phase epitaxy.

System of multimode STM/AFM microscopy (multiSPM)

Includes a set of five scanning probe microscopes combined with other techniques (microspectroscopy, electrochemistry) for correlation of micromorphology and physical properties (composition, adhesion, luminescence, local electronic properties) with resolution down to several nanometers.

System of advanced technologies for preparation of carbon and silicon nanostructures (nanoCVD)

Uses chemical vapour deposition to prepare thin films of nanocrystalline diamond and/or silicon for use in nanoelectronics and bioelectronics applications. Core facilities include two unique microwave deposition systems used for growth of diamond thin films and carbon nano-forms (CNTs, graphene).

System of advanced transmission electron microscopy (advaTEM)

Includes in situ TEM Jeol 1200FX with acceleration voltage 120 kV for dynamic experiments (double tilt straining holder, single tilt heating-straining holder) and state-of-the-art analytical ?field emission? TEM with accelerating voltage 200kV FEI Tecnai F20 X-Twin equipped with STEM-HAADF, EDS, Lorentz microscopy, energy filter GIF.

System of lithographic structuring of thin film materials (beamLITHO)

The system is used to define lateral micro- and nanostructures by optical and electron beam lithography. The electron beam lithography has resolution in the order of nanometers; in combination with reactive ion etching this allows for preparing test samples and chips with details on the scale of tens of nanometers.

System of scanning electron and ion microscopy (dualSEM)

Includes dual beam SEM-FIB FEI Quanta 3D FEG for 3D characterization and micromachining equipped with analytical detectors EBSD and EDS, GISes (Pt, W, SiO2, enhanced etch), nanomanipulator, and a routine SEM FEI Pheanom with simple control via the touch screen for training and educational purposes.

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Date of last update: 19/06/2019
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